Reaction System - Hitachi 902 Service Manual

1.4 Reaction System

Reaction disk
Reaction cell
No. of reaction cells
Reaction cell control
Sample pipetting position : One position (fixed)
Reagent pipetting position : One position (fixed)
Reaction temperature
Stirring
Stirring position
Reacting solution volume : Minimum ; 250 µL (minimum required volume for photometry)
Photometric position
Cell rinsing
Carryover evasion
: Turntable type disk (10-minute reaction per rotation)
: Optical path length 6 mm (area 6 × 5 mm)
: 48
: One rotation + one pitch feed (18 seconds)
: 37 ± 0.1° C (warm water circulating system)
: By means of stirring rod rotation
Timing for stirring; after each addition of R1,R2,R3
Stirring possible for a minimum volume of 100 µL
: One position (fixed)
Maximum ; 500 µL (temperature control, rinsing upper limit)
: One position (fixed)
: After completion of photometry (rinsing 3 times; rinsing with
detergent not performed)
: Rinsing for carryover evasion possible; throughput may decrease
by specifying cell carryover evasion
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